PLASMA SNMS TYPE INA-X BASE SYSTEM OVERVIEW

Technical Characteristics

• Plasma-SNMS system for surface, interface and thin films analysis.
• Analysis of conducting as well as insulating materials.
• High depth resolution about 1 nm (depending on sputter parameters and simple).
• Detection Sensitivity: 5-10 cps/ppm.
• Mass Spectrometer: QMA 410, differentially pumped with Secondary electron multiplier (SEM) detector.
• Mass Range: 0-340 amu.
• Detection limit about 1 ppm (for most elements besides plasma and atmospheric gases plus corresponding interfering elements)
• Operation Pressure: 2.3x10-3
• Typical Sputter Rates from 1 nm/s up to 10 nm/s
• Sputter Diameter: 1-10 mm
• Type: ECWR Plasma using ions from inert gas (such as Ar+, Kr+)
• Sputter Modes: Direct bombardment mode (DBM) and high frequency mode (HFM)
• Sample Cooling with LN2 down to 150 K